SHISEIDO Anessa Perfect uv sunscreen skincare milk SPF50+/PA++++ 60ml
Tax included.
Adding 50% skin care ingredients, the strongest skin care sunscreen in the history of sunscreen.
Adopt "stronger water-resistant" sunscreen technology, super waterproof and anti-sweat, sunscreen that can be used on the face and body, can be easily removed with soap and so on.
• Pass the 80-minute water bath test, which has super long-lasting water resistance.
Main ingredients
Dimethylsiloxane, water, zinc oxide, ethanol, ethylhexylmethoxycinnamate, talc, isopropyl myristate, cyclopentasiloxane, isododecane, orklin, Titanium dioxide, PEG-9 polydimethylsiloxane, hexyl diethylaminohydroxybenzoate, glycerol, diisopropyl sebacate, silicon dioxide, palmitic dextrin, xylitol, trimethylsilyl Oxysilicic acid, sodium chloride, cherry leaf extract, sodium ethanoate hyaluronate, aloe vera kiss, soluble collagen, PPG-17, triethoxyoctyl silane, isostearic acid, distearyldimethylformate Ammonium chloride, aluminum hydroxide, stearic acid, EDTA-3NA, BHT, tocopherol, isopropanol, BG, sodium metabisulfite, phenoxyethanol, spices, etc.
Adopt "stronger water-resistant" sunscreen technology, super waterproof and anti-sweat, sunscreen that can be used on the face and body, can be easily removed with soap and so on.
• Pass the 80-minute water bath test, which has super long-lasting water resistance.
Main ingredients
Dimethylsiloxane, water, zinc oxide, ethanol, ethylhexylmethoxycinnamate, talc, isopropyl myristate, cyclopentasiloxane, isododecane, orklin, Titanium dioxide, PEG-9 polydimethylsiloxane, hexyl diethylaminohydroxybenzoate, glycerol, diisopropyl sebacate, silicon dioxide, palmitic dextrin, xylitol, trimethylsilyl Oxysilicic acid, sodium chloride, cherry leaf extract, sodium ethanoate hyaluronate, aloe vera kiss, soluble collagen, PPG-17, triethoxyoctyl silane, isostearic acid, distearyldimethylformate Ammonium chloride, aluminum hydroxide, stearic acid, EDTA-3NA, BHT, tocopherol, isopropanol, BG, sodium metabisulfite, phenoxyethanol, spices, etc.
